q to control “EUV” masks and “EUV” reticles designed for built-in circuits, not specified by here 3B001.g, and having a mask “substrate blank” specified by 3B001.j.” A technological Be aware is included to explain that masks or reticles by using a mounted pellicle are considered masks and reticles.
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The material may very well be obtained from BIS and is also accessible for inspection about the BIS Web site at content/license-exceptions#license-exception-IEC.
specialized Take note: to the needs of 3A001.i, a `50 percent-wave voltage' (`Vπ') will be the utilized voltage essential to come up with a section modify of 180 degrees while in the wavelength of light propagating throughout the optical modulator.
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CC relates to “software package” for computerized finger-print products managed by 4A003 for CC motives
There exists a restricted deemed export or deemed reexport exclusion in the license requirements Within this paragraph (a)(five)(i) of this part for the following “computer software” or “engineering” ECCNs Except if for foreign folks whose most recent citizenship or long term residency is usually a place specified in state Group D:one or D:five: ECCNs 2D910; 2E910; 3D001 (“application” for “EUV” masks and reticles in ECCN 3B001.q); 3D901 (for “software program” for quantum goods in ECCNs 3A901.b and 3B904 and for scanning electron microscopes (SEM) in ECCN 3B903); 3D907 “program” intended to extract “GDSII” or equal knowledge; 3E001 (“know-how” for “EUV” masks and reticles in ECCN 3B001.
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missing equivalent info on the remaining technological innovation, BIS is applying deemed export and reexport controls for foreign individuals for “technology” and “software package” in ECCNs 2D910 and 2E910 for additive producing products (2B910).
This hold off in compliance is to permit for submission and processing of license programs or implementation of inner compliance procedures on things coated by these ECCNs.
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2E910 “Technology”, not specified somewhere else, “specifically made” or modified to the “enhancement” or “generation” of equipment specified in ECCN 2B910.
a.four.b. at the very least one particular preclean chamber created to supply a surface area planning usually means to clean the surface of the wafer; and
Our intention is to produce instruction units that present sensible operational scenarios and put together aircrews for mission results.